Dissolution & Deposition

Dissolution and Deposition Work in this area focused on useful in cleaning or lithographic processes; deposition, such as might be useful in making films, coatings or devices; and materials which might be employed in either of these processes. The goal is to develop fundamental understanding of phenomena involved in dissolution of materials and formation of thin films, coatings and structures at CO2 interfaces in order to demonstrate feasibility of sustainable processes, materials and devices.

Team Leader:  Professor Ruben G. Carbonell

Project # Lead PI Project Title Students Associates Status
2 DeSimone Investigating CO2 -based CMP processes: Designing surfactants to stabilize colloidal silica & chelants adjuncts to remove copper in condensed CO2 Ginger Denison July 02
4 DeSimone Design of New 157 nm negative tone photoresist for totally dry lithography based on CO2 Devin Flowers
(Mary-Kate Boggiano)		 July 02
23 Carbonell Spin Coating & development processes using liquid CO2 Erik Hoggan July 02
24 Carbonell Thin film & particle removal in a rotating disk geometry Mohammed Elbaccouch July 02
25 Carbonell Thin films by free meniscus coatings Brian Novick, Jelka Kurik July 02
30 Grant Precision rate sensors for CO2 based microelectronic dissolution/deposition processes You Ting Wu
49 Johnston Static and dynamic interfacial properties involing Polymers & surfactants at CO2 interfaces Jasper Dickson July 02
51 Korgel Formation of metal & semiconductor nano particles & self-assembly onto surfaces Parag Shah; Aaron Saunders July 02
53 Rossky Molecular principles for solubility in CO2 with applications to surfactant performance Sandro DaRocha July 02
61 Roberts Surfactant/Supercritical CO2 mixtures for microelectronics processing Nneka Ubaka-Adams, Gifty Osei, Kamalesh Munirathinam, Ali Finley, Leah Williamson July 02
 
Participating Students